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Molecular formula : MW : CAS :
nature : physical vapor deposition is one. With an inert gas (usually argon) glow discharge to make the evaporation of the metal or alloy steam ions; Ion accelerated by the electric field and deposited on the negative charge matrix (parts), inert gas, the pressure of 0.133-1.33 Pago (10-2-10-3 care), which increases the voltage 500-2000 volts. The film deposition process, the workpiece by argon ion impact sputtering workpiece surface to remove the dirt.
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