| Original document(20 pages) 中文版 |
In this invention, the basic constituents of the photosensitive mixture include: a) a diazo-polycondensate resulted from monomers A-N2X and B where the two components are linked together by a divalent atom derived from hydroxyl compound which can undergo further concensation, and where component A-N2X is derived from aromatic diazo compound capable to condence with formaldehyde, while component B is derived from compound without a diazo group and can likewise condense with formaldehyde in strong acidic medium; b) a compound which is capable to polymerize via free radical mechanism; c) an initiator for photo-polymerization; and d) a polymeric bonding agent which is insoluble in water but soluble in organic solvent. |
Application Number
申请号 |
85106160 |
Application Date
申请日 |
1985.08.15 |
| Title 名称 |
Photosensitive composition and the photosensitive metarial prepared from it |
Publication Number
公开号 |
1009202 |
Publication Date
公开日 |
1987.03.04 |
| Approval Pub. Date |
|
Granted Pub. Date |
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| International Classification 分类号 |
G03C1/60 |
Applicant(s) Name
申请人 |
Hoechst AG (DE) Frankfurt/Main 80, Federsl Republic of Germany |
| Address 地址 |
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| Inventor(s) Name 发明人 |
Frommeld.Deutscher, Hans.Dieter, Hartmut Steppan.Deutscher |
| Attorney & Agent 代理人 |
LUO YINGMING CHEN JIZHUANG |
| More information 更 多 信 息 |
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