| Original document(12 pages) 中文版 |
The invention relates to a plasma processing device, which can transfer liquid of processing material kept in a reacting container into plasma so as to promote processing reaction. The plasma processing device provides a light source which can emit ultraviolet beam or laser beam to irradiate and transfer the processing liquid into plasma as as to bring about photoreaction. The processing liquid is transferred from microwave energy to plasma and motivated after being irradiated by ray beam so as to acquire a quickened processing reaction. Moreover, the surface of the processing material is irradiated by ray beam in order to prevent damage to the surface of the processing material during the processing of the plasma. Therefore, the invention can process material quickly without damage. |
Application Number
申请号 |
86105186 |
Application Date
申请日 |
1986.08.22 |
| Title 名称 |
Plasma treatment arrangement |
Publication Number
公开号 |
1011415 |
Publication Date
公开日 |
1987.06.03 |
| Approval Pub. Date |
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Granted Pub. Date |
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| International Classification 分类号 |
H01L21/02 |
Applicant(s) Name
申请人 |
Hitachi, Ltd. |
| Address 地址 |
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| Inventor(s) Name 发明人 |
Takayoshi Osakatani |
| Attorney & Agent 代理人 |
LI QIANG |
| More information 更 多 信 息 |
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