Original document(16 pages)  中文版
    A gas distribution ring for a plasma gun comprises a ring member with two sets of gas inlet orifices extending from the outer surface inwardly through the ring member. The outer surface has an undulated groove for an O-ring formed therein, and the orifices are positioned with respect to the undulated O-ring such that one set of orifices are isolated on one side of the O-ring and the other set of orifices are isolated on the other side of the O-ring. In a preferred embodiment the orifices of one set are radial with respect to the axis of the ring, and the orifices on the other side of the undulated O-ring have a tangential component to provide vortical gas flow in the arc region of the gun. The gas distribution ring positioned in the plasma spray gun permits a simple choice between radial and vortical flow in the arc region of the gun, without alteration of the gun.
Application Number
申请号
87103361 Application Date
申请日
1987.05.05
Title 名称 Gas distribution ring for plasma gun
Publication Number
公开号
1019305 Publication Date
公开日
1988.06.29
Approval Pub. Date Granted Pub. Date
International Classification 分类号 H05H1/24;H05H1/34
Applicant(s) Name
申请人
The Perkin-Elmer Co. (US) Main Avenue Norwalk, Connecticut 06859-0181 USA
Address 地址
Inventor(s) Name 发明人 Anthony J. Rotolico;Daniel Yakovlevitch
Attorney & Agent 代理人 GU TIANHUA
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