Original document(17 pages) Authorized document(17 pages) 中文版
    The invention relates to a method for the production of opaque quartz glass wherein a blank is made from synthetic SiO2 crystals and heated to form a blank body made of opaque quartz glass at a given vitrification temperature. A method for the production of pure, opaque quartz glass is disclosed wherein said quartz glass has a homogeneous pore distribution and a high density, a high viscosity and a lower tendency to devitrify. According to the invention, the SiO2 crystals are formed from an at least partially porous agglomerate of SiO2 primary particles (21; 31) having a specific surface (according to BET) between 1.5 m<2>/g and 40 m<2>/g with a stamping density of at least 0.8 g/cm<3>. SiO2 granulate (21; 31) suitable for use in performing the procedure is characterized in that it is composed of an at least partially porous agglomerate of SiO2 primary particles and has a specific surface (according to BET) between 1.5 m<2>/g and 40 m<2>/g in addition to a stamping density of at least 0.6 g/cm<3>.
Application Number
申请号
00817710 Application Date
申请日
2000.12.14
Title 名称 Method for production of opaque quartz glass, SiO2 granulate suitable for use in performing the method and component made of opaque quartz glass
Publication Number
公开号
1413175 Publication Date
公开日
2003.04.23
Approval Pub. Date 2005.05.11 Granted Pub. Date 2005.05.11
International Classification 分类号 C03C3/06;C03C1/02;C03B19/10
Applicant(s) Name
申请人
Heraeus Quarzglas GmbH & Co., KG
Address 地址
Inventor(s) Name 发明人 W. Werdecker;H. Fabian;U. Gertig
Attorney & Agent 代理人 hu qiang zhao xin
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