Original document(8 pages) Authorized document(8 pages) 中文版
    A method and composition for removing sodium-containing materials such as photoresist from microcircuit substrate material utilizes 1,2-Diaminocyclohexanetetracarboxylic Acid in an organic solvent.
Application Number
申请号		 01806705 Application Date
申请日		 2001.03.19
Title 名称 Method and composition for removing sodium-containing material from microcircuit substrates
Publication Number
公开号		 1418330 Publication Date
公开日		 2003.05.14
Approval Pub. Date 2005.12.07 Granted Pub. Date 2005.12.07
International Classification 分类号 G03F7/42;C11D7/50
Applicant(s) Name
申请人		 Mallinckrodt Beck Inc.
Address 地址
Inventor(s) Name 发明人 George Schwartzkopf
Attorney & Agent 代理人 huang yifen wu xiaonan
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