Original document(32 pages)  中文版
    A holder driving mechanism holds a wafer holder with gripping portions, and swings it within a wafer processing bath. When the peripheral portion of a wafer comes into contact with the distal end portion of a swing support member, the wafer rotates and vertically moves in the wafer holder. The wafer can be efficiently swung, and processing can be made uniform. By supplying ultrasonic waves from an ultrasonic bath, the processing rate can be increased.
Application Number
申请号
02130553 Application Date
申请日
2002.08.16
Title 名称 Method for mfg. semiconductor substrate
Publication Number
公开号
1420524 Publication Date
公开日
2003.05.28
Approval Pub. Date Granted Pub. Date
International Classification 分类号 H01L21/00
Applicant(s) Name
申请人
Canon K.K.
Address 地址
Inventor(s) Name 发明人 Yanagita Ichiryu;Sakakuchi Kiyofumi
Attorney & Agent 代理人 wang yonggang

  
Read-only code mask and use method thereof
Device and method for regulating pressure at expulsion in vacuum system of semiconductor reaction chamber
Method for mfg. semiconductor device
High dielectric grid medium Al2O3/BaO/Al2O3 structure and preparing method thereof
Cutter
Oxygen doped Si-C compound etching stop layer
Wet resist removing process after silk etching
Process for improving DxZ silicon oxide adhesion to silk
System and method for enhancing dielectric film
Method for mfg. automatically aligned field oxidation layer by oxygen atom implantation
Google
Note:All patent data come from State Intellectual Property Office of the People's Republic of China. If there were discrepancies between here and the State Intellectual Property office, the later is more accurate. The patent data is only for public exchange and learning purposes. We are not responsible for the adverse consequences with unverified use of the data.