Original document(21 pages)  中文版
    The present invention provides new light absorbing compositions suitable for use as an antireflective coating ('ARC') with an overcoated resist layer. ARCs of the invention are etch resistant and that exhibit increased etch rates in standard plasma etchants. Preferred ARCs of the invention have significantly increased oxygen content relative to prior compositions.
Application Number
申请号		 01802441 Application Date
申请日		 2001.08.17
Title 名称 Antireflective coating compsns.
Publication Number
公开号		 1398362 Publication Date
公开日		 2003.02.19
Approval Pub. Date Granted Pub. Date
International Classification 分类号 G03F7/09
Applicant(s) Name
申请人		 Shipley Co L.L.C.
Address 地址
Inventor(s) Name 发明人 Mao Zhibiao;Suzanne Coley;Timothy G. Adams
Attorney & Agent 代理人 ge bo liang ji
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