Original document(6 pages) Authorized document(6 pages) 中文版
    A preparation method of laser damage-resisting wide-band antireflecting film with ethyl emtasilicate as presoma includes mixing water, absolute alcohol, polyvinyl pyrrolidone and polyglycol in a certain proportion in the presence of ammonia water catalyst, reaction by sufficient stirring, ageing, and film plating. The present invention has the advantages of mild preparation condition, low cost and simple operation, and the prepared SiO2 film has antireflecting performance of 400-600 nm bandwidth and high laser damage resistance.
Application Number
申请号
02140488 Application Date
申请日
2002.07.19
Title 名称 Prepn of laser damage-resisting wide-band antireflecting film
Publication Number
公开号
1399147 Publication Date
公开日
2003.02.26
Approval Pub. Date Granted Pub. Date 2004.09.22
International Classification 分类号 B05C3/00,C03C17/30,G02B1/11
Applicant(s) Name
申请人
Shanxi Inst. of Coal Chemistry, Chinese Academy of Sciences
Address 地址 030001
Inventor(s) Name 发明人 Sun Yuhan, Zhang Bin
Attorney & Agent 代理人 li yi
More information 更  多  信  息


 Related patents information
Low temperaure catalyst for producing intermediate fraction oil with heavy alkane and its preparation method
Catalyst for preparing gamma-butyrolactone and its preparing method
Preparation method hydrophobic anti-reflection silicon dioxide film with high threshold for resisting laser damage
Middle-temp isomerizing catalyst and its preparing process
Process for preparing WOx-ZrO2 catalyst of super-strong acid
Dual-pore molecular sieve and its preparing process
Functional organic dual-pure molecular sieve and its preparing process
Si-Zn-Al molecular sieve and its synthesizing process
Si-Zn molecular sieve and its synthesizing process
Composite dual-pure Si-Al molecular sieve and its preparing process
Google
Note:All patent data come from State Intellectual Property Office of the People's Republic of China. If there were discrepancies between here and the State Intellectual Property office, the later is more accurate. The patent data is only for public exchange and learning purposes. We are not responsible for the adverse consequences with unverified use of the data.