A production method for a flat panel display, capable of producing with a high reliability the TFT of a pixel unit and the TFT of a scanning unit, the method comprising a thin film forming step for forming an amorphous silicon thin film on a substrate consisting of a pixel unit and a drive unit, a dehydrogenation annealing step of applying a laser beam to an amorphous silicon thin film formed on the drive unit but not to an amorphous silicon thin film formed on the pixel unit out of the amorphous silicon thin film to release hydrogen contained in the amorphous silicon thin film on the drive unit, and then a crystallization annealing step of further applying a laser beam to the amorphous silicon thin film on the drive unit to change the amorphous silicon thin film on the drive unit to a polycrystalline silicon thin film. |