Original document(10 pages) Authorized document(10 pages) 中文版
    Substantially transparent electrodes are formed on a substrate by a process including forming on the substrate, in order, a bottom high index layer, a metallic conductive layer, and a top high index layer with a conductivity of at least about 400<8>1/square; and chemically etching the bottom high index layer, the top high index layer and the conductive layer to form discrete electrodes in the metallic conductive layer.
Application Number
申请号		 01809336 Application Date
申请日		 2001.04.13
Title 名称 Etching process for making electrodes
Publication Number
公开号		 1429409 Publication Date
公开日		 2003.07.09
Approval Pub. Date 2007.04.11 Granted Pub. Date 2007.04.11
International Classification 分类号 H01L31/18;G02F1/134;G02F1/133
Applicant(s) Name
申请人		 3M Innovative Properties Co.
Address 地址
Inventor(s) Name 发明人 N.S. Lennhoff;J. Ram
Attorney & Agent 代理人 xu xun
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