Original document(24 pages)  中文版
    A self contained photosensitive material comprises a support; an imaging layer on the support, the imaging layer comprising a developer material and a plurality of photosensitive microcapsules encapsulating a photosensitive composition and a color precursor; and a protective coating on the imaging layer, the protective coating comprising a cured film of a water-soluble or water-dispersible resin, wherein upon image-wise exposing the imaging layer to actinic radiation and rupturing the microcapsules, the color precursor is released from the microcapsules and reacts with the developer material to form a color image.
Application Number
申请号
01141285 Application Date
申请日
2001.08.10
Title 名称 Single-base photosensitive imaging system
Publication Number
公开号
1355445 Publication Date
公开日
2002.06.26
Approval Pub. Date Granted Pub. Date
International Classification 分类号 G03B27/04;G03C1/73;G03C1/76;G03C5/00
Applicant(s) Name
申请人
Cycolor System Co., Ltd.
Address 地址
Inventor(s) Name 发明人 Uchihori Takahiro;Higuchi Tetsuya
Attorney & Agent 代理人 ren zonghua

  
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