Original document(28 pages) Authorized document(28 pages) 中文版
    A source of photons includes a discharge chamber, a plurality of ion beam sources in the discharge chamber and a neutralizing mechanism. Each of the ion beam sources electrostatically accelerates a beam of ions of a working gas toward a plasma discharge region. The neutralizing mechanism at least partially neutralizes the ion beams before they enter the plasma discharge region. The neutralized beams enter the plasma discharge region and form a hot plasma that radiates photons. The photons may be in the soft X-ray or extreme ultraviolet wavelength range and, in one embodiment, have wavelengths in a range of about 10-15 nanometers.
Application Number
申请号
01809937 Application Date
申请日
2001.05.17
Title 名称 Extreme ultraviolet source based on colliding neutral beams
Publication Number
公开号
1430865 Publication Date
公开日
2003.07.16
Approval Pub. Date 2005.08.31 Granted Pub. Date 2005.08.31
International Classification 分类号 H05G2/00
Applicant(s) Name
申请人
Plex LLC
Address 地址
Inventor(s) Name 发明人 Malcolm W. Mcgeoch
Attorney & Agent 代理人 guo xiaodong
More information 更  多  信  息


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