Original document(25 pages) Authorized document(24 pages) 中文版
    New photoresists are provided that are suitable for short wavelength imaging, including sub-200 nm, particularly 193 nm. Resists of the invention contain a polymer that comprises fluoro substitution and alicyclic leaving groups, such may be provided by polymerization of an alkyl acrylate compound.
Application Number
申请号		 02160084 Application Date
申请日		 2002.12.31
Title 名称 Photoresist composite for short wavelength purpose
Publication Number
公开号		 1432869 Publication Date
公开日		 2003.07.30
Approval Pub. Date 2007.05.30 Granted Pub. Date 2007.05.30
International Classification 分类号 G03F7/00;G03F7/038
Applicant(s) Name
申请人		 Sipley Co.
Address 地址
Inventor(s) Name 发明人 T.G. Agams;G.G. Barclay
Attorney & Agent 代理人 ge bo peng yiqun
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