Original document(17 pages) Authorized document(17 pages) 中文版
    The present invention disclosed a production process of photoresist composite and production process of semiconductor element using such a photoresist composition covering suitable substrate which can produce photoresist image on the substrate.
Application Number
申请号		 02142837 Application Date
申请日		 1996.09.18
Title 名称 Production process of photoresist composite and production process of semiconductor element with the composite
Publication Number
公开号		 1432870 Publication Date
公开日		 2003.07.30
Approval Pub. Date 2005.02.16 Granted Pub. Date 2005.02.16
International Classification 分类号 C08G8/04;G03F7/004
Applicant(s) Name
申请人		 Clariant International, Ltd.
Address 地址
Inventor(s) Name 发明人 M.D. Lamann;D.P Aubin;D.N. Kerhaner
Attorney & Agent 代理人 huang shuhui
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