| Original document(129 pages) Authorized document(125 pages) 中文版 |
A novel photoacid generator containg a structure of the following formula (I), wherein R is a monovalent organic group with a fluorine content of 50 wt% or less, a nitro group, a cyano group, or a hydrogen atom, and Z<1> and Z<2> are individually a fluorine atom or a linear or branched perfluoroalkyl group having 1-10 carbon atoms, is provided. When used in a chemically amplified radiation-sensitive resin composition, the photoacid generator exhibits high transparency, comparatively high combustibility, and no bioaccumulation, and produces an acid exhibiting high acidity, high boiling point, moderately short diffusion length in the resist coating, and low dependency to mask pattern density. |
Application Number
申请号 |
02160643 |
Application Date
申请日 |
2002.06.28 |
| Title 名称 |
Acid generating agent, sulfonic acid, sulfonic acid and radiation-sensitive resin composition |
Publication Number
公开号 |
1432873 |
Publication Date
公开日 |
2003.07.30 |
| Approval Pub. Date |
2006.09.20 |
Granted Pub. Date |
2006.09.20 |
| International Classification 分类号 |
G03F7/004 |
Applicant(s) Name
申请人 |
JSR Corp. |
| Address 地址 |
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| Inventor(s) Name 发明人 |
Ebata Satoshi;Kometa Eiji;Nagai Tomoki |
| Attorney & Agent 代理人 |
chen cuan |
| More information 更 多 信 息 |
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