| Original document(136 pages) 中文版 |
An exposure apparatus comprising a light source (1) and an illumination optical system IL that illuminates the mask M with light from this light source (1) to form a pattern DP of the mask M in the exposure apparatus, then transfering onto a photosensitive substrate P. The illumination optical system IL comprises wavelength width changeover unit (6, 7) that changes over the wavelength width of the light that is directed onto said mask M in accordance with the photosensitivity characteristics of the photosensitive substrate. |
Application Number
申请号 |
03100263 |
Application Date
申请日 |
2003.01.07 |
| Title 名称 |
Exposure device and method |
Publication Number
公开号 |
1432874 |
Publication Date
公开日 |
2003.07.30 |
| Approval Pub. Date |
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Granted Pub. Date |
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| International Classification 分类号 |
G03F7/20;H01L21/027 |
Applicant(s) Name
申请人 |
Nikon Corp. |
| Address 地址 |
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| Inventor(s) Name 发明人 |
Kato Masaki;Oyama Motoo |
| Attorney & Agent 代理人 |
wang huaqiang |
| More information 更 多 信 息 |
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