Original document(16 pages) Authorized document(17 pages) 中文版
    Providing grayscales by simultaneously projecting two or more patterned projection beams onto the substrate, each of which has a different pattern and a different intensity.
Application Number
申请号		 02145590 Application Date
申请日		 2002.11.29
Title 名称 Photoetching equipment and device making process
Publication Number
公开号		 1432875 Publication Date
公开日		 2003.07.30
Approval Pub. Date 2006.04.12 Granted Pub. Date 2006.04.12
International Classification 分类号 G03F7/22;H01L21/027
Applicant(s) Name
申请人		 ASML Netheland B.V.
Address 地址
Inventor(s) Name 发明人 K.D. Van Demast
Attorney & Agent 代理人 zhang shegao
More information 更  多  信  息


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