Original document(14 pages)  中文版
    The invention restrains malfunction of a device caused by back electromotive force of a load containing a component of an inductance L. This device comprises an epitaxial layer formed on a P-type silicon substrate, a P+ diffusion layer 3 that insolates the epitaxial layer into an N- epi-layer 4 of an element formation region and an N- epi-layer 2 of an ineffective region, and an aluminum wiring 6 that electrically connects the N- epi-layer 2 of the ineffective region and the P+ diffusion layer 3. Since an electric potential of the N- epi-layer 2 of the ineffective region can be made equal to that of the P+ diffusion layer 3, even when electrons are injected into the element formation region by the back electromotive force of the load of the inductance L, supplying of the electrons from the P+ diffusion layer 3 to the ineffective region is restrained.
Application Number
申请号
02143169 Application Date
申请日
2002.09.16
Title 名称 Semiconductor device
Publication Number
公开号
1435886 Publication Date
公开日
2003.08.13
Approval Pub. Date Granted Pub. Date
International Classification 分类号 H01L21/76;H01L27/04
Applicant(s) Name
申请人
Mitsubishi Electric Corp.
Address 地址
Inventor(s) Name 发明人 Kotai Keiichi;Yamamoto Fumihisa;Terashima Tomohide
Attorney & Agent 代理人 liu zongjie wang zhongzhong
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