Original document(15 pages) Authorized document(15 pages) 中文版
    A method of manufacturing a semiconductor component includes providing a substrate (110) with a surface (119), providing a layer (120) of undoped gallium arsenide over the surface of the substrate, forming a gate contact (210) over a first portion of the layer, and removing a second portion of the layer.
Application Number
申请号
01811030 Application Date
申请日
2001.05.10
Title 名称 Method for mfg. semiconductor device and semiconductor device thereby
Publication Number
公开号
1436367 Publication Date
公开日
2003.08.13
Approval Pub. Date 2005.06.08 Granted Pub. Date 2005.06.08
International Classification 分类号 H01L21/337;H01L29/80
Applicant(s) Name
申请人
Motorola, Inc.
Address 地址
Inventor(s) Name 发明人 William C. Peatman;Eric S. Johnson;Adolfo C. Reyes
Attorney & Agent 代理人 zhu haibei
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