Original document(27 pages)  中文版
    The invention concerns a method for making substrates, in particular for optics, electronics, or optoelectronics, comprising an operation which consists in bonding a useful element (10, 16) of a first material on the surface of a support (2), comprising a second material. The invention is characterised in that: it further comprises an operation which consists in depositing an amorphous material (3), on the surface of the support (2), formed with the second material and designed to receive the element consisting of the first material or on the surface of the useful element formed with the first material and designed to be bonded on the support (2); and the second material is less noble than the first material. The invention also concerns a method for making substrates, in particular for optics, electronics or optoelectronics, comprising an operation which consists in bonding a useful element (10) of a first material on a surface of a support (2), comprising a second material. The method is characterised in that the useful element (10) or the support (2) comprises a polycrystalline material at least on its surface designed to be bonded, and it further comprises, prior to the bonding operation, an operation which consists in forming a layer of amorphous material (2), on the surface or surfaces comprising the polycrystalline material.
Application Number
申请号
01811069 Application Date
申请日
2001.06.15
Title 名称 Method for making substrates and resulting substrates
Publication Number
公开号
1436369 Publication Date
公开日
2003.08.13
Approval Pub. Date 2007.11.14 Granted Pub. Date 2007.11.14
International Classification 分类号 H01L21/762
Applicant(s) Name
申请人
S.O.I. Silicon on Insulator Technologies
Address 地址
Inventor(s) Name 发明人 A. Auberton-Herve
Attorney & Agent 代理人 bao ling wang gang
More information 更  多  信  息


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