| Original document(51 pages) Authorized document(51 pages) 中文版 |
The objective of this invention is to provide an atmospheric substitution method for chamber device, chamber device, electro-optic device and organic EL device having same, that can substitute inert gas in a chamber room with atmospheric air efficiently within a short period of time. The solution of the present invention is that in the method of substituting inert gas inside a chamber room 11 with atmospheric air of an chamber device 3 according to this invention, an exhaust passage 102 of the chamber room 11 is opened while shutting a gas supply passage 138 of the inert gas. External air is forced into the chamber room 11, to realize substitution of the inert gas inside the chamber room 11 with the atmospheric air. |
Application Number
申请号 |
03102540 |
Application Date
申请日 |
2003.02.09 |
| Title 名称 |
Treatment-room device and atmosphere substitution method, and photoelectric device comprising said device |
Publication Number
公开号 |
1438824 |
Publication Date
公开日 |
2003.08.27 |
| Approval Pub. Date |
2006.08.23 |
Granted Pub. Date |
2006.08.23 |
| International Classification 分类号 |
H05B33/10;H01L33/00 |
Applicant(s) Name
申请人 |
Seiko Epson Corp. |
| Address 地址 |
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| Inventor(s) Name 发明人 |
Hayashi Takayuki |
| Attorney & Agent 代理人 |
wang huimin |
| More information 更 多 信 息 |
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