| Original document(17 pages) 中文版 |
A chemical-solution supplying apparatus (100) for supplying slurry to an exterior device (7) includes a supply route (A) in which abrasive suspension flows at a predetermined flow rate and a return route (C) connecting the supply route and a storage tank (1). When the supply of the slurry to the exterior device is stopped, the abrasive suspension is returned from the supply route to the storage tank through the return route. This is done in order to maintain the flow of the abrasive suspension in the supply route so that abrasive is prevented from coagulating and settling. |
Application Number
申请号 |
03825579 |
Application Date
申请日 |
2003.06.20 |
| Title 名称 |
Chemical-solution supplying apparatus
|
Publication Number
公开号 |
1713967 |
Publication Date
公开日 |
2005.12.28 |
| Approval Pub. Date |
|
Granted Pub. Date |
|
| International Classification 分类号 |
B24B57/02,B01F5/12 |
Applicant(s) Name
申请人 |
Fujitsu Ltd |
| Address 地址 |
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| Inventor(s) Name 发明人 |
Fukuizumi Masataka, Hiraoka Naoki, Matoba Tooru, Nakamura Takeshi, Osuda Hiroshi |
| Attorney & Agent 代理人 |
gao longxin wang yushuang |
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