Original document(25 pages)  中文版
    The invention is to achieve stable emission of electrons and a high output of electrons even with impression at low voltage. The electron emission device includes a first electrode; a semiconductor barrier that has a first face disposed to face the first electrode and a second face which is opposite face of the first face, and is formed with a wide bandgap semiconductor; an insulating material that forms a space sealed between the first electrode and the semiconductor barrier; an inert gas that is encapsulated in the space; a second electrode that is disposed to face a second face of the semiconductor barrier interposing vacuum therebetween; a first voltage applying unit that applies a voltage between the first electrode and the semiconductor barrier; and a second voltage applying unit that applies a voltage between the semiconductor barrier and the second electrode.
Application Number
申请号
200610108357 Application Date
申请日
2006.08.02
Title 名称 Electron emission device
Publication Number
公开号
1909142 Publication Date
公开日
2007.02.07
Approval Pub. Date Granted Pub. Date
International Classification 分类号 H01J1/00;H01J1/30;H01J1/34
Applicant(s) Name
申请人
Tokyo Shibaura Electric Co.
Address 地址
Inventor(s) Name 发明人 Sakai Tadashi;Ono Tomio;Sakuma Naoshi;Yoshida Hiroaki;Suzuki Mariko
Attorney & Agent 代理人 li zheng yu jing
More information 更  多  信  息


 Related patents information
Discharge electrode, discharge lamp and method for producing discharge electrode
Discharge lamp
An opto-acoustoelectric device and methods for analyzing mechanical vibration and sound
Cold cathode for discharge lamp having diamond film
Semiconductor light-emitting device and producing method for the same
Discharge lamp
Diamond film formation method and film formation jig thereof
Heat sink, electronic device, method of manufacturing heat sink, and method of manufacturing electronic device
Google
Note:All patent data come from State Intellectual Property Office of the People's Republic of China. If there were discrepancies between here and the State Intellectual Property office, the later is more accurate. The patent data is only for public exchange and learning purposes. We are not responsible for the adverse consequences with unverified use of the data.