Original document(42 pages)  中文版
    The invention relates to a semi-conductor processing system, which comprises: a vacuum lock, a transmission room, and one or several processing chambers, wherein said transmission room is between the vacuum lock and the processing chamber; the processing chamber is around the transmission room; the transmission room has transmitter. The invention can use the motion of transmitter, without adjusting the vacuum chamber or processing chamber vertically, to install and detach the elements, to reduce the cost and improve the yield. The invention also discloses a relative processing chamber with special ventilate system, to make the processing platforms form reaction gas shield, to avoid the reaction gas interference.
Application Number
申请号
200510028562 Application Date
申请日
2005.08.05
Title 名称 Semiconductor technology processing system and method
Publication Number
公开号
1909182 Publication Date
公开日
2007.02.07
Approval Pub. Date Granted Pub. Date
International Classification 分类号 H01L21/00;H01L21/68;B65G49/07;C23C16/00;C23F1/00
Applicant(s) Name
申请人
Advanced Micro-Fabrication Equipment (Shanghai) Inc.
Address 地址
Inventor(s) Name 发明人 Chen Aihua
Attorney & Agent 代理人 wang ji
More information 更  多  信  息


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