Provided is a processing chamber, flat display device production device, used for generating plasma in the interior and processing at least one substrate. The structure of the processing chamber makes the single substrate with large area be processed and a plurality of substrates with small area be processed at the same time in the processing chamber. According to the invention, the substrate with large area is processed moreover a plurality of substrates with small area be processed at the same time without changing the structure of the apparatus specially. Thereby, the effect of the invention lies in: easily adapting with all sorts of treatment conditions to make the production efficiency of the flat display device maximize and adapting the required price in the market forwardly. In addition, a plurality of substrates can be processed at a time. So the effect of the invention lies in: reducing the required time for processing the substrates. |