| Original document(47 pages) 中文版 |
A method for forming a prescribed pattern by discharging a functional liquid onto a substrate by using a droplet discharge method comprises a process for forming a bank so that the substrate has a first region having width that is larger than the flight path of the functional liquid, and a second region having width that is narrower than the first region; a process for discharging a solvent contained in the functional liquid to the second region; and a process for discharging the functional liquid to the first region for allowing the functional liquid to flow to the second region. |
Application Number
申请号 |
200610115651 |
Application Date
申请日 |
2004.05.26 |
| Title 名称 |
Pattern forming method |
Publication Number
公开号 |
1909187 |
Publication Date
公开日 |
2007.02.07 |
| Approval Pub. Date |
|
Granted Pub. Date |
|
| International Classification 分类号 |
H01L21/00;H01L21/768;H01L21/3205;H01L21/288;H01L21/84;H01L21/336;H01L21/48;H05K3/12 |
Applicant(s) Name
申请人 |
Seiko Epson Corp. |
| Address 地址 |
|
| Inventor(s) Name 发明人 |
Hirai Toshimitsu;Mikoshiba Toshiaki |
| Attorney & Agent 代理人 |
li xianglan |
| More information 更 多 信 息 |
|
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