Original document(17 pages)  中文版
    The invention provides a manufacturing method for a semiconductor photoelectrochemical cell, comprising the steps of burning a base made of titanium or a titanium alloy in an atmosphere of 700 DEG C to 1000 DEG C at a rate of temperature increase of no lower than 5 DEG C/second so that a titanium oxide layer is formed on the surface, and thus, mixing titanium metal into said titanium oxide layer.
Application Number
申请号		 200610104214 Application Date
申请日		 2006.08.01
Title 名称 Manufacturing method for semiconductor photoelectrochemical cell and semiconductor photoelectrochemical cell
Publication Number
公开号		 1912171 Publication Date
公开日		 2007.02.14
Approval Pub. Date Granted Pub. Date
International Classification 分类号 C23C8/10;H01L31/18;H01L31/04;H01L31/0224;H01M14/00
Applicant(s) Name
申请人		 Nakagawa Yoshinori
Address 地址
Inventor(s) Name 发明人 Nakagawa Yoshinori;Wada Kiyohisa
Attorney & Agent 代理人 liu jifu
More information 更  多  信  息


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