| Original document(16 pages) 中文版 |
A sputtering target includes a plurality of compositional regions and is a disk type, in which each of the regions contains independent component where each compositional region forms the circumferential side of the disk and when the circle is through at least two compositional regions, the average compositions of the circumferential side of the disk are different according to the different semidiameter of the circle. |
Application Number
申请号 |
200610110114 |
Application Date
申请日 |
2006.08.08 |
| Title 名称 |
Sputtering target |
Publication Number
公开号 |
1912176 |
Publication Date
公开日 |
2007.02.14 |
| Approval Pub. Date |
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Granted Pub. Date |
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| International Classification 分类号 |
C23C14/34;C23C14/06 |
Applicant(s) Name
申请人 |
Ricoh Co., Ltd. |
| Address 地址 |
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| Inventor(s) Name 发明人 |
Hibino Eiko;Ito Kazunori;Takada Mimikiko;Okura Hiroko;Deguchi Koji |
| Attorney & Agent 代理人 |
song li jia jinghuan |
| More information 更 多 信 息 |
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