| Original document(18 pages) 中文版 |
A film deposition apparatus capable of improving accuracy for forming a fine pattern is provided. The film deposition apparatus comprises a first nozzle (102a) for discharging first chemical species on a base body (160), a second nozzle (102b) for discharging second chemical species on the base body (160), a material storage chamber (101a) for storing the first chemical species and a reaction-active species generation unit 103a for generating reaction-active species, and a material storage chamber (101b) for storing the second chemical species and a reaction-active species generation unit (103b) for generating the reaction-active species. The first nozzle (102a) and the second nozzle (102b) are installed so that the flow of the discharged first chemical species crosses the flow of the second chemical species. |
Application Number 申请号 |
200610110168 |
Application Date 申请日 |
2006.08.04 |
| Title 名称 |
Apparatus and method for forming a film, patterning method and method for manufacturing an optical device |
Publication Number 公开号 |
1912179 |
Publication Date 公开日 |
2007.02.14 |
| Approval Pub. Date |
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Granted Pub. Date |
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| International Classification 分类号 |
C23C16/448;C23C16/52 |
Applicant(s) Name 申请人 |
Seiko Epson Corp. |
| Address 地址 |
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| Inventor(s) Name 发明人 |
Miyazawa Takashi |
| Attorney & Agent 代理人 |
wang huimin |
| More information 更 多 信 息 |
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