| Original document(25 pages) 中文版 |
Disclosed is a vacuum processing device, the invention especially relates to a device etching or depositing the substrates such as the glass plate of the LCD, the wafer of semiconductor. Also disclosed is a chamber of the vacuum processing device which comprising: a chamber mainbody with a polygon-shape; at least one sidewall unit detachably connected with one sidewall of the mainbody, the sidewall comprises a horizontal part with a certain curvature on the upper surface which is parallel to the mainbody; a upper panel unit and a lower panel unit which detachably connected with the upper part and the lower part of the mainbody and the sidewall separately to cover the same. |
Application Number
申请号 |
200610002076 |
Application Date
申请日 |
2006.01.24 |
| Title 名称 |
Chamber for vacuum processing device and device having the chamber |
Publication Number
公开号 |
1913099 |
Publication Date
公开日 |
2007.02.14 |
| Approval Pub. Date |
|
Granted Pub. Date |
|
| International Classification 分类号 |
H01L21/00;H01L21/20;H01L21/3065;H01L21/67;C23C16/44;C23C14/22;C23F4/00 |
Applicant(s) Name
申请人 |
IPS Co., Ltd. |
| Address 地址 |
|
| Inventor(s) Name 发明人 |
Cho Saeng-hyeun;Lee Joo-hee;Hahn Chae-byeong |
| Attorney & Agent 代理人 |
zhang xiaojuan xu lin |
| More information 更 多 信 息 |
|
|
|