The invention provides a heating device where the amount of the gas to be jetted from a jet port of each gas passage is made uniform, and the deposition of a reaction film is reduced. The heating device (100) comprises: a substrate heating face (10a) at which gas jet ports (12h) are formed; and gas feed ports (18) where the gas is fed, and is provided with: a substrate (10) composed of a ceramic-containing material in which a resistance heating element 11 is buried; gas passages (12) each of which communicates from the gas feed port (18) to the gas jet port (12h) and is formed in the substrate (10); and regulation parts each of which makes the cross-sectional area of the gas passage (12) variable. |