Original document(21 pages)  中文版
    A method of defining three-dimensional structure from mask layout for computer simulation provides a technology for defining a three-dimensional structure of liquid crystal cell which comprises a apparatus of liquid crystal display for designing and analyzing a apparatus of liquid crystal display. A method of generating three-dimensional structure which comprised of material layers between upper substrate and lower substrate, provides a generation method of three-dimensional structure for computer simulation by depositing material layers under the upper substrate and over the lower substrate, and sandwiching a center insertion layer between the deposited upper and lower material layers for a case which includes tapered structure of material layer for the substrate.
Application Number
申请号
200480041360 Application Date
申请日
2004.05.19
Title 名称 Method of automatically generating the structures from mask layout
Publication Number
公开号
1914614 Publication Date
公开日
2007.02.14
Approval Pub. Date Granted Pub. Date
International Classification 分类号 G06F17/50
Applicant(s) Name
申请人
Sanayi System Co., Ltd.
Address 地址
Inventor(s) Name 发明人 Won Tae-young;Yoon Sang-ho
Attorney & Agent 代理人 li hui
More information 更  多  信  息


 Related patents information
Method of performing a panoramic demonstration of liquid crystal panel image simulation in view of observer's viewing angle
Google
Note:All patent data come from State Intellectual Property Office of the People's Republic of China. If there were discrepancies between here and the State Intellectual Property office, the later is more accurate. The patent data is only for public exchange and learning purposes. We are not responsible for the adverse consequences with unverified use of the data.