Original document(40 pages)  中文版
    The present invention discloses a method and system of controlling a process from run-to-run for semiconductor manufacturing. The method of control utilizes a process model to establish a relationship between process control input data and process control output data. The method of control involves minimizing the difference between target process control output data and process control output data predicted by applying the process model to the new process control input data.
Application Number
申请号		 200580003999 Application Date
申请日		 2005.02.01
Title 名称 Method and system for run-to-run control
Publication Number
公开号		 1914618 Publication Date
公开日		 2007.02.14
Approval Pub. Date Granted Pub. Date
International Classification 分类号 G06F19/00
Applicant(s) Name
申请人		 Tokyo Electron Ltd.
Address 地址
Inventor(s) Name 发明人 Yue Hongyu;Wiseman Joseph William
Attorney & Agent 代理人 wang yi
More information 更  多  信  息


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