Original document(19 pages)  中文版
    In a substrate processing apparatus for processing a substrate in a hermetic container equipped with an exhaust tube and a gas introducing tube, an introducing port of the gas introducing tube is positioned inside the exhaust tube to make uniform an atmosphere in the hermetic container, in the vicinity of an exhaust port of the exhaust tube.
Application Number
申请号		 200610115521 Application Date
申请日		 2006.08.15
Title 名称 Apparatus for processing substrate and apparatus for processing electron source substrate
Publication Number
公开号		 1917120 Publication Date
公开日		 2007.02.21
Approval Pub. Date Granted Pub. Date
International Classification 分类号 H01J9/02;H01J9/00;H01J31/12
Applicant(s) Name
申请人		 Canon KK
Address 地址
Inventor(s) Name 发明人 Takatsu Kazumasa
Attorney & Agent 代理人 zhang gao
More information 更  多  信  息


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