Original document(55 pages)  中文版
    A liquid material is placed on a substrate as a droplet to form a film on the substrate. At least either one of a concentration of solids in the liquid material and a drying rate of the droplets is used as a parameter to control a form of a dried film of the droplets. Moreover, a first droplet is placed on a substrate, the first droplet is dried to form a dried film of a form in which a thickness of an edge is larger than that of a central part, and a second droplet is placed in a region surrounded by the edge section of a dried film of the first droplet to form a dried film of the second droplet. Furthermore, the liquid material is placed on the substrate as a droplet to form a film on the substrate, and a dried film of the droplet is formed by contracting the droplet.
Application Number
申请号
200610132143 Application Date
申请日
2004.07.07
Title 名称 Process for forming a film, process for manufacturing a device
Publication Number
公开号
1933101 Publication Date
公开日
2007.03.21
Approval Pub. Date Granted Pub. Date
International Classification 分类号 H01L21/00;H01L21/02;H01L21/208;H01L21/288;H01L21/3205;H01L21/768;H01L21/027;H01L51/00;G03F7/16;H05K3/10;B05D3/02
Applicant(s) Name
申请人
Seiko Epson Corp.
Address 地址
Inventor(s) Name 发明人
Attorney & Agent 代理人 songge cheng
More information 更  多  信  息


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