The invention is concerned with the multi-step low-temperature interlayer manufacture method for forming multi-layer interlayer structure, it is: the original interlayer uses the high-producing energy low-film quality deposition method, the outer interlayer uses low-producing energy high-film quality deposition method, therefore forms the multi-layer interlayer, the original interlayer of the inner layer is loosen but high-producing energy, the outer interlayer is compact and can protect the inner layer. The invention can achieve reasonable energy production, and high-film quality is unified. |