Original document(14 pages)  中文版
    The invention is concerned with the dual metal mosaic structure, including: the base, the dielectric layer, the hard mask layer, the touching window, and the lead; the dielectric layer is located on the base; the hard mask layer is located on the dielectric layer; the touching window is located in the dielectric layer, the horizontal section of the touching is the dissymmetry circled outline; the lead is located in the hard mask layer and the dielectric layer, it is also on the touching window and electronic connection with it, the lead is with a side protuberance and located on the edge of the touching window.
Application Number
申请号
200510103865 Application Date
申请日
2005.09.16
Title 名称 Dual-metal inserting structure and producing method thereof
Publication Number
公开号
1933123 Publication Date
公开日
2007.03.21
Approval Pub. Date Granted Pub. Date
International Classification 分类号 H01L21/768;H01L23/52
Applicant(s) Name
申请人
Lianhua Electronic Co., Ltd.
Address 地址
Inventor(s) Name 发明人
Attorney & Agent 代理人 taofeng bei houyu
More information 更  多  信  息


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