Original document(20 pages)  中文版
    The present invention provides an avalanche photodiode capable of raising productivity. An n-type InP buffer layer, an n-type GaInAs light absorption layer, an n-type GaInAsP transition layer, an n-type InP electric field adjusting layer, an n-type InP avalanche intensifying layer, an n-type AlInAs window layer and a p-type GaInAs contact layer are grown in order on an n-type InP substrate. Next, Be is ion-injected into an annular area along the outer periphery of a light receiving area which is activated by heat treatment so as to form an inclined joint, to obtain a p-type peripheral area for preventing an edge break down. Further, Zn is selectively diffused thermally into the light receiving area until it reaches the n-type InP avalanche intensifying layer so as to form a p-type conductive area.
Application Number
申请号
200610153930 Application Date
申请日
2006.09.12
Title 名称 Avalanche photodiode
Publication Number
公开号
1933187 Publication Date
公开日
2007.03.21
Approval Pub. Date Granted Pub. Date
International Classification 分类号 H01L31/107
Applicant(s) Name
申请人
Mitsubishi Electric Corp.
Address 地址
Inventor(s) Name 发明人
Attorney & Agent 代理人 wangsi beng
More information 更  多  信  息


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