Original document(36 pages)  中文版
    An object of the present invention is to provide a laser irradiation method and a laser irradiation apparatus for irradiating an irradiation surface with a linear beam having more homogeneous intensity by blocking a low-intensity part of the linear beam without forming the fringes due to the diffraction on the irradiation surface. In the laser irradiation, a laser beam emitted from a laser oscillator 101 passes through a slit 102 so as to block a low-intensity part of the laser beam, the traveling direction of the laser beam is bent by a mirror 103, and an image formed at the slit is projected to an irradiation surface 106 by a convex cylindrical lens 104.
Application Number
申请号		 200580009439 Application Date
申请日		 2005.03.24
Title 名称 Laser irradiation method and laser irradiation apparatus
Publication Number
公开号		 1934682 Publication Date
公开日		 2007.03.21
Approval Pub. Date Granted Pub. Date
International Classification 分类号 H01L21/268;H01L21/20;H01L21/336;H01L29/786
Applicant(s) Name
申请人		 Semiconductor Energy Lab
Address 地址
Inventor(s) Name 发明人
Attorney & Agent 代理人 chenbin
More information 更  多  信  息


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