The purpose of this invention is to improve cleaning efficiency of a substrate processing apparatus. The substrate processing apparatus is provided with a process container for holding inside a substrate to be processed, a gas supplying means for supplying a gas in the process container for processing, a holding table provided in the process container for holding the substrate to be processed, and a shielding board for separating a space in the processing container into a first space and a second space. The substrate processing apparatus, which is provided with a first exhausting path for exhausting the first space, and a second exhausting path for exhausting the second space, is used. |