Original document(19 pages)  中文版
    An image element structure includes a base plate, a grid, a dielectric layer, a semiconductor layer, many semiconductor projections, a source electrode, a drain electrode and a reflected image element electrode. The grid is set on the base plate and the dielectric layer is set on the base plate to cover the grid. The semiconductor layer is set in the dielectric layer of the grid top; the semiconductor projection is set on the dielectric layer. The source electrode and the drain electrode are all set on the semiconductor layer. The reflected image element electrode is set on the dielectric layer and cover the semiconductor projection, also the reflected image element electrode is connected with the drain electrode. So the structure has the high reliability.
Application Number
申请号
200610137381 Application Date
申请日
2006.10.20
Title 名称 Pixel structure and its mfg. method
Publication Number
公开号
1936662 Publication Date
公开日
2007.03.28
Approval Pub. Date Granted Pub. Date
International Classification 分类号 G02F1/1333;G02F1/1343
Applicant(s) Name
申请人
Youda Photoelectric Co., Ltd.
Address 地址
Inventor(s) Name 发明人
Attorney & Agent 代理人 guowei
More information 更  多  信  息


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