Original document(35 pages)  中文版
    A process for the patterning of a desired substance on a surface includes: (i) charging a vessel (12) with a compressed fluid; (ii) introducing into the vessel a first feed stream comprising a solvent and the desired substance and a second feed stream comprising the compressed fluid, wherein the desired substance is less soluble in the compressed fluid relative to its solubility in the solvent and the solvent is soluble in the compressed fluid, wherein the first feed stream is dispersed in the compressed fluid, allowing extraction of the solvent into the compressed fluid and precipitation of particles of the desired substance; (iii) exhausting components from the vessel (12) through a restrictive passage (16) including a discharge device (13) that produces a shaped beam of particles of the desired substance at a point beyond an outlet of the discharge device (13); and (iv) exposing a receiver surface (14) to the shaped beam of particles.
Application Number
申请号
200580010374 Application Date
申请日
2005.03.31
Title 名称 Ress process for selective deposition of particulate material
Publication Number
公开号
1938105 Publication Date
公开日
2007.03.28
Approval Pub. Date Granted Pub. Date
International Classification 分类号 B05D1/02
Applicant(s) Name
申请人
Eastman Kodak Co.
Address 地址
Inventor(s) Name 发明人
Attorney & Agent 代理人 weixin hua zhaosu lin
More information 更  多  信  息


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