| Original document(42 pages) 中文版 |
The present invention provides a coating method and apparatus capable of stably performing the thickness control of a coating film in a spinless fashion particularly the uniformalization of film thickness at the coating scanning terminal part with an excellent reproducibility. The discharge pressure of the resist nozzle(78)starts to be attenuated at the point of time ta when a fixed delayed time is elapsed after a resist pump is stopped at the point of time t1 when a resist nozzle 78 is passed through a passing point X1. The upward movement of the resist nozzle 78 with respect to a substrate G and the attenuation of the scanning speed start respectively at each of a prescribed time point t2, t3 near to the attenuation of the discharge pressure of the resist nozzle 78. In the mid time when the discharge pressure of the resist nozzle 78 is attenuated, the resist nozzle 78 is moved upward and the scanning speed is decreased. |
Application Number
申请号 |
200610151489 |
Application Date
申请日 |
2006.09.12 |
| Title 名称 |
Coating method and coating device |
Publication Number
公开号 |
1939603 |
Publication Date
公开日 |
2007.04.04 |
| Approval Pub. Date |
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Granted Pub. Date |
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| International Classification 分类号 |
B05C5/02;B05B13/02;B05B15/06;B05C13/02 |
Applicant(s) Name
申请人 |
Tokyo Electron Ltd. |
| Address 地址 |
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| Inventor(s) Name 发明人 |
Ikeda Fumihiko;Ikemoto Daisuke |
| Attorney & Agent 代理人 |
longchun |
| More information 更 多 信 息 |
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