| Original document(12 pages) 中文版 |
The invention is related to wet-process etching device for wafer, and wet-process etching method. The method includes following steps: first, placing a wafer to an etching fluid; then, rotating wafer in etching fluid. |
Application Number
申请号 |
200510118748 |
Application Date
申请日 |
2005.10.31 |
| Title 名称 |
Wet process device for etching wafer, and wet process etching method |
Publication Number
公开号 |
1959938 |
Publication Date
公开日 |
2007.05.09 |
| Approval Pub. Date |
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Granted Pub. Date |
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| International Classification 分类号 |
H01L21/306;H01L21/311;H01L21/3213;H01L21/00 |
Applicant(s) Name
申请人 |
Wanghong Electronics Co., Ltd. |
| Address 地址 |
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| Inventor(s) Name 发明人 |
Peng Guohao;Zeng Guobang |
| Attorney & Agent 代理人 |
taofeng bei houyu |
| More information 更 多 信 息 |
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