Original document(16 pages)  中文版
    The invention discloses a composite for etching metal layer. The composite contains (by wt.%): 55-80 phosphonic acid, 3-15 nitric acid, 5-20 acetic acid, 0.5-10 phosphate, 0.1-5 chlorine compound, 0.01-4 diazo compound and water.
Application Number
申请号
200510114837 Application Date
申请日
2005.11.17
Title 名称 Composition for etching metal layer and method for forming metal pattern by using same
Publication Number
公开号
1966772 Publication Date
公开日
2007.05.23
Approval Pub. Date Granted Pub. Date
International Classification 分类号 C23F1/16;G02F1/136
Applicant(s) Name
申请人
LG Philips LCD Co., Ltd.
Address 地址
Inventor(s) Name 发明人 Kim Chong-Eil;Lee Jiong-moo;Song Gye-chan;Cho Sam-jeung;Shin Hyeun-Chael;Kim Nan-suh;Lee Ki-beam
Attorney & Agent 代理人 xujin guo qijian guo
More information 更  多  信  息


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