| Original document(16 pages) 中文版 |
The invention discloses a composite for etching metal layer. The composite contains (by wt.%): 55-80 phosphonic acid, 3-15 nitric acid, 5-20 acetic acid, 0.5-10 phosphate, 0.1-5 chlorine compound, 0.01-4 diazo compound and water. |
Application Number 申请号 |
200510114837 |
Application Date 申请日 |
2005.11.17 |
| Title 名称 |
Composition for etching metal layer and method for forming metal pattern by using same |
Publication Number 公开号 |
1966772 |
Publication Date 公开日 |
2007.05.23 |
| Approval Pub. Date |
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Granted Pub. Date |
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| International Classification 分类号 |
C23F1/16;G02F1/136 |
Applicant(s) Name 申请人 |
LG Philips LCD Co., Ltd. |
| Address 地址 |
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| Inventor(s) Name 发明人 |
Kim Chong-Eil;Lee Jiong-moo;Song Gye-chan;Cho Sam-jeung;Shin Hyeun-Chael;Kim Nan-suh;Lee Ki-beam |
| Attorney & Agent 代理人 |
xujin guo qijian guo |
| More information 更 多 信 息 |
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